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Film forming | ARC | Plasma CVD | UBMS |
Raw material | Solid carbon | C2H2 (gas) | Solid carbon |
Temperature | ~400 | ~200 | ~250 |
Composition | May hydrogen-free | Hydrogen | May hydrogen-free |
Coefficient of friction | 0.2~0.5 | 0.1~0.2 | 0.1~0.2 |
Hardness | 2000~8000 | 1500~6000 | 1000~2000 |
Surface Rounghness | Ra~10um | Ra~0.02um | Ra~0.1um |
Adhesion | Good | Good | Weak |
Insulation | Good | Available | Me-DLC Conductive |